APOLLO
Commercial Scale Wafer Coating
High Throughput Wafer Coating System
The APOLLO system product line sets new benchmarks in atomic layer deposition productivity and cost effectiveness. Designed for high volume semiconductor wafer-based production, our Semi-S2 certified APOLLO systems utilize the high productivity of SMFD-ALD. The result is a flexible, modular system that can be easily configured to our customers’ needs.
Performance
APOLLO provides fully automatic cassette-to-cassette ALD processes with high throughput performance at the lowest cost of ownership. APOLLO leads in every aspect of ALD productivity, performance and cost, and sets a new standard for efficiency while reducing environmental impact. With its ‘zero-waste’ processing, APOLLO lowers factory power consumption and occupies a smaller footprint on the clean-room floor.
CAPABILITIES
SPECIFICATIONS
BEST IN CLASS, MAINTENANCE AND SERVICE
Al2O3, SiO2, AZO, TiO2, GaN, TiN, Bi2O3, Pt, Co, Cu, Ta2O5, Hf2O3, MLD
Cost-effective, high-productivity ALD of many films and combination films including HfO2, ZrO2, Ta2O5, Al2O3, ZnO, ZnAlO, SiO2, HfSiO, TiO2, <300° TiN, BN, GaN, Nb3N5 and more.
Copper Barrier, ALD-Cap, Optical, Adhesion/Seeding, TCOs
APOLLOTM uses our millisecond response ALD manifold that integrates our patented Fast Pneumatic Valves (FPV) to deliver over 100 million trouble-free cycles of composite and nanolaminate ALD films. This manifold is the only ALD manifold that can switch composition every cycle without any throughput penalty. Field proven, our valves set records for speed, reliability, lifetime and safety, while performing at temperatures as high as 220°C. Forge Nano’s ALD valves are the only doubly contained, spill-free UHP valves on the market.
Ozone Generator, QCM, Plasma
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