PANDORA

Powder R&D System

Atomic Level Surface Engineering Made Easy
The PANDORA system provides easy and visible mechanical fluidization of powders for ALD applications. Optional GMP compliance adds the benefit of ALD for pharmaceutical applications. Powders, flats and unique substrates may all be processed within the PANDORA reactor system.

Performance

The system features a small footprint with minimal utility needs making it affordable and simple to install. The system is ideal for labs or research groups new to ALD or powder coatings.

BASE CONFIGURATION

3 Vapor Draw Precursor Sources
200mL Reactor Volume
Heating up to 200 °C
Static and Continuous Dosing Options
Automated Recipe Management, Data Logging, and Alarming via Remote HMI

UPGRADES

Up to 3 Lower Vapor Pressure (LVP) Heated Precursor Source
Gaseous Chemical Inlets
Mass Spectrometer
On-Demand Ozone Generator and Integrated Destruct
Volumetric Dosing Tank
Custom Substrate Fixtures
Quartz Crystal Microbalance
Foreline Pump
cGMP Compliance

Particle Atomic Layer Deposition Research

Chemistries:

Oxides, Metals, Nitrides

Applications:

Wide substrate ranges, excessively fluffy or difficult to fluidize powders, pellets/capsules/small objects, Pharma APIs

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