PANDORA
Commercial Scale Wafer Coating
Atomic Level Surface Engineering Made Easy
The PANDORA system provides easy and visible mechanical fluidization of powders for ALD applications. Optional GMP compliance adds the benefit of ALD for pharmaceutical applications. Powders, flats and unique substrates may all be processed within the PANDORA reactor system.
Performance
The system features a small footprint with minimal utility needs making it affordable and simple to install. The system is ideal for labs or research groups new to ALD or powder coatings.
BASE CONFIGURATION
- 3 Vapor Draw Precursor Sources
- 200mL Reactor Volume
- Heating up to 200 °C
- Static and Continuous Dosing Options
- Automated Recipe Management, Data Logging, and Alarming via Remote HMI
UPGRADES
- Up to 3 Bubbler Style Heated Precursor Sources
- Gaseous Chemical Inlets
- Mass Spectrometer
- On-Demand Ozone Generator and Integrated Destruct
- Volumetric Dosing Tank
- Custom Substrate Fixtures
- Quartz Crystal Microbalance
- Foreline Pump
- cGMP Compliance
Particle Atomic Layer Deposition Research
Chemistries:
Oxides, Metals, Nitrides
Applications:
Wide substrate ranges, excessively fluffy or difficult to fluidize powders, pellets/capsules/small objects, Pharma APIs
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