What is Atomic Layer Deposition?
Atomic Layer Deposition is a surface engineering technique that creates angstrom thick, uniform, pinhole free coatings on materials. During this gas phase process, chemicals called precursors are introduced to the material to be coated, known as the substrate. The chemical reactions caused by the precursors cause atomic level coatings to be applied one atomic layer at a time. These coatings can be used in a number of ways to improve the performance of the base material.