COMMERCIAL SCALE HIGH THROUGHPUT OBJECT COATING SYSTEMS 

The HELIOS industrial line offers cost-effective ALD coatings on parts ranging from microns to meters. HELIOS coating systems bring film quality, atomic-level control and conformal performance of ALD to industrial manufacturing, opening up new possibilities and enabling novel applications as protective of functional surface engineered objects.

DOWNLOAD BROCHURE  

HELIOS is our commercial scale solution for atomic layer deposition of objects and high surface area substrates.

PERFORMANCE

HELIOS is designed for efficiency with ‘zero-waste’ processing, substantially lower factory power consumption and small footprint. A patented integrated abatement ensures minimal maintenance and exceeds up times records of legacy CVD and PVD equipment.
 

KEY FEATURES

• Deposition chamber size up to 1m x 1m
• High throughput growth 60-150 Å/min
• Maintenance at 500 μm intervals 
• Zero-waste abatement system 
• Up to 90% efficiency of consumables

APPLICATIONS 

• Electronic devices 
• Sensors, OLED displays
• PCBs, CoBs, ICs and modules
• Medical devices and sensors 
• Optical coatings
• Display and Solar technology
• Photo-catalytic coatings
• Encapsulation for environmental,
corrosion, and high voltage insulation
 

Performance: HELIOS is designed for efficiency with ‘zero-waste’ processing, substantially lower factory power consumption and small footprint. A patented integrated abatement ensures minimal maintenance and exceeds up times records of legacy CVD and PVD equipment.

Modular, simple and flexible, HELIOS coating      systems deliver unmatched performance and     productivity at a low cost of ownership. Pin-hole free, low stress and exceptionally conformal ALD films are available for the first time at sub-second cycle times and high productivity compatible with industrial applications requirements. Forge Nano’s patented SMFD-ALD™, delivers performance and productivity without sacrificing film quality. 

Configuration: HELIOS accommodates  parts with many different shapes and sizes with the combination of modular, parts-specific tooling and a generic loader. Standard chamber size from 1.5-80 liters or up to 1m X 1m panels (custom sizes available).

System and Components: HELIOS incorporates numerous proprietary innovative features and components that deliver optimal ALD performance with reliable, repeatable and safe operation.

An integrated ALD manifold with millisecond response integrates 10 of our patented Fast Pneumatic Valves (FPV) to deliver over 100 million trouble-free cycles of composite and nano-laminated ALD films. This manifold is the only ALD manifold that can switch composition every cycle without any throughput penalty. Field proven since 2005, our FPV valves set the records for speed, reliability, lifetime and safety, all while performing at temperatures as high as 220 C.

Capabilities: Cost-effective ALD of films including ZrO2, Al2O3, ZnO, ZnAlO, ZnBO, SiO2, TiO2, TiAlO, TiN, BN, Nb3N5 and more. Seamless and reproducible film engineering with nanolaminate and nanocomposite capabilities, adhesion in excess of 1000 PSI to many different substrates including tin, gold, copper, FR4, polyimides, many different solder mask materials, polyurethanes, ceramics, adhesives and more.

 

Download our brochure for more information, or CONTACT us to speak to a surface engineering expert.

 

VAMPIRE FOUND!

Do not be fooled by his kind eyes and rugged handsomeness! Run for your life! 

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VAMPIRE FOUND!

Didn’t you learn your lesson last time? These handsome devils are dangerous!