THE PALD SUMMIT IS NOW PART OF THE ASE SUMMIT
Steven George is a Professor in the Department of Chemistry at the University of Colorado at Boulder. He received his B.S. in Chemistry from Yale University and his Ph.D. in Chemistry from the University of California at Berkeley. Dr. George is directing a research effort focusing on atomic layer deposition (ALD), atomic layer etching (ALE) and molecular layer deposition (MLD). This research is examining new surface chemistry, measuring thin film growth and etching rates, and developing new applications and reactors for ALD, ALE and MLD. Dr. George has received a number of awards including the John A. Thornton Memorial Award from the AVS (2017) and the ALD Innovation Award from the AVS International Conference on Atomic Layer Deposition (2013). Dr. George is a Fellow of the AVS (2000) and the APS (1997).
Jonas Sundqvist, Ph.D. – Sr. Technology Analyst of TECHCET— covers ALD and CVD precursors and related technologies, and is the co-chair of the Critical Materials Council (CMC) Conference. His over 20 years of work experience includes Group Leader of the Thin-Film Technologies Group at The Fraunhofer Institute for Ceramic Technologies and Systems (IKTS) and of the High-k devices group at Fraunhofer’s Center Nanoelectronic Technologies (CNT), which included 28nm node work for GLOBALFOUNDRIES Fab1. At Infineon Memory Development Centre (MDC) he developed high-k and metal nitride ALD processes, and at Qimonda he was a materials manager focused on the ALD / CVD precursors supply-chain. He is the founder of BALD Engineering, an independent blog and networking platform for ALD. He holds a Ph.D. and a M.S. in inorganic chemistry from Uppsala University, Sweden, a B.S. in electrical and electronics engineering from Lars Kagg, and nine patent
Dr. Mikko Utriainen is an ALD pioneer since 1990s and CEO of Chipmetrics Ltd since 2020. His talk describes Chipmetrics’ PillarHall® Test Chip platform for characterisation of thin film conformality. He also emphasizes some recent use cases of the PillarHall® Test Chip in ALD thin film deposition development.
Noureddine Adjeroud works in Luxembourg Institute of Science and Technology (LIST) as Laboratory Manager. He has deep expertise in the fields of vapour deposition techniques and in ALD. He worked with major semiconductor factories such as Intel, IBM, SAMSUNG. He has been LIST Lead engineer since 2015 and is the Engineer in Charge of the ALD Centre of Expertise. In 2020 Noureddine Adjeroud joined the program committee for the 2021 edition of the AVS-ALD international conference.
Katherine Hurst is a senior scientist at the National Renewable Energy Laboratory (NREL). Her research focuses on the fundamental understanding of gas-solid interactions with the goal of creating novel materials with designed interfaces, controlled morphologies, particle sizes, and tailored ad/absorption properties. Her synthesis expertise includes materials for fuel cell and electrolysis catalysis, gas storage, photovoltaic and battery applications using ALD.
During her Ph.D. at the Eindhoven University of Technology in the Netherlands, Noemi Leick’s research focused on developing and understanding the atomic layer deposition of atomically thin Pt-group metal systems, such as Ru, Pt, and Pd. Her first postdoctoral research at the Colorado School of Mines, focused on the in situ FTIR-based study during plasma-assisted SiNx thin films. In 2017, Noemi joined the H2 storage group at NREL where her main area of research is synthesizing and testing novel host materials for H2 storage, using techniques such as atomic layer deposition and thermal programmed desorption.
I study the chemistry and physics of surface processes through a variety of tools, including ambient pressure photoelectron spectroscopy, infrared reflection absorption spectroscopy, and scanning probe microscopy. My main focus is on the interaction of molecules with flat surfaces, often well-defined model systems, but trying to expand to more complex geometries lately. Two-dimensional porous silicates are some of my favorite materials. During nights and weekends, I am a crypto enthusiast.
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