Forge Nano offers a number of passivation solutions through its films. Particles, polymers, and objects can all be protected with films as thin as physically possible. A wide range of protections are offered including UV blocking, electrical insulation, and anti-oxidation. Protection effects can be observed with films as thin as 1nm and can be tuned to exact performance requirements with excellent reproducibility due to self-limiting deposition.

Passivation using SiO2

ALD, Atomic Layer Deposition, SiO2, Silicon Dioxide, Passivation, ALD Particles, ALD Powders.
SiO2 provides superior coating protection.

Silicon dioxide ALD thin films provide superior protection over any other thin film process. When 250 nm pigment grade TiO2 is coated with 2 nm of SiO2 it provides high quality protection against high temperatures and conc. H2SO4 when compared to an uncoated particle.

Cost competitive solutions:

Powders: $0.1-10/kg (surface area/thickness dependant)
Polymers: $1-10/m2
MEMS/NEMS Devices: ¢ to $ per device.

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